Photolithography_Fab Solutions_yuray-tech

Photolithography

YURAY delivers precision photolithography services for semiconductor and advanced-packaging applications. With double-sided UV lithography, DUV lithography, projection steppers, and step-and-scan systems

Double-Side
Alignment
100 nm
Resolution
< 30 nm
Overlay Accuracy
4–12 inch
Thick Resist Processing

OVERVIEW

Yuray provides precision wafer patterning services through a comprehensive photolithography platform. Our capabilities include double-side UV lithography, mask aligners, projection steppers, and step-and-scan lithography systems, supported by integrated coating, baking, developing, plasma cleaning, and HMDS priming processes. We support standard photolithography flows for 4-, 6-, 8-, and 12-inch wafers, as well as selected glass and advanced-packaging substrates. From large-area alignment and thick-photoresist processing to fine-pitch redistribution and bump patterning, Yuray provides process solutions for semiconductor, TSV, TGV, and micro-bumping applications.

SERVICES

Yuray provides integrated photolithography processing from substrate preparation through pattern inspection. Process routes are selected according to feature size, resist thickness, substrate material, surface topography, alignment requirement, and the subsequent etching, deposition, electroplating, or lift-off process.

Contact Aligner

Contact and proximity UV lithography for large-feature patterning, thick photoresist processing, and rapid prototyping. Supports double-side alignment for wafer-level packaging and MEMS applications.

TECHNICAL SPECIFICATIONS
Parameter Specification
Resolution800 nm
Overlay Accuracy500 nm
Wafer Size4 / 6 / 8 inch
Resist Thickness1 – 20 µm (thick resist)
Alignment ModeDouble-side / single-side
Typical ApplicationPlating molds, thick resist, rapid prototyping

Project Stepper

TECHNICAL SPECIFICATIONS
Parameter Specification
Resolution100 – 350 nm
Overlay Accuracy< 30 – 100 nm
Wafer Size4 / 6 / 8 inch
CD Uniformity< 30 – 50 nm
Lithography ModeProjection stepper / step-and-scan
Typical ApplicationFine-pitch RDL, bump patterning, multilayer lithography

Step-and-Scan Lithography

TECHNICAL SPECIFICATIONS
Parameter Specification

CASE STUDY

At YURAY, we provide precision photolithography patterning services across wafers and glass substrates — from mask design and spin coating to development and inspection, delivering fine-feature patterns tailored to your device requirements.

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Fine-Pitch Patterning on Glass

Service Chain
01
Key ProcessPhotolithography on glass substrate for TGV/RDL
02
Key SpecificationsLine / Space: 10 / 10 μm Substrate: 515 × 510 mm glass panel Feature resolution: 5 μm Alignment: < 1 μm
03
Key DeliverablesPatterned glass panels delivered Optical & SEM characterization report
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RDL Patterning on 8-inch Silicon

Service Chain
01
Key ProcessPhotolithography & development for RDL patterning
02
Key SpecificationsLine / Space: 5 / 5 μm Wafer size: 8-inch Overlay accuracy: < 0.5 μm CD uniformity: < 10%
03
Key DeliverablesPatterned wafers delivered CD & overlay inspection report


METROLOGY & QUALITY ASSURANCE

Reliable Deposition Quality, Complimentary Characterization Included At YURAY, deposition service means more than simply depositing a film. We combine qualified equipment, controlled processes, experienced engineering support, and rigorous quality management to deliver stable, repeatable thin-film performance. Every project can be supported with a free comprehensive characterization report, providing customers with transparent and actionable quality data. Depending on the service requirements, reports may include film thickness, uniformity, surface condition, adhesion, composition, and other relevant characterization results. Choose YURAY for high-quality film deposition, responsive technical support, and verified results—without additional reporting costs

SOW Requirements

Quantified SOW Requirements

YURAY converts SOW requirements into measurable criteria, defining clear quality targets and inspection standards.

Process Improvement

Continuous Process Improvement

YURAY identifies root causes of issues, such as interface peeling, and implements effective corrective solutions.

Characterization Reports

SOW-Aligned Characterization Reports

YURAY delivers characterization reports with indicators directly aligned to SOW requirements for transparent verification.

Third-Party Confirmation

Third-Party Double Confirmation

YURAY uses independent third-party laboratories to double-confirm critical indicators through characterization and inspection.



Need a Custom Wafer or Fabrication Process?

Share your drawings, wafer specifications, or project requirements — our engineering team will prepare a technical proposal and quote within one business day.